UV-3D Printing System
System Performance
- LD source @405 nm, power ≥100 mW, laser lifetime ≥15,000 hours.
- Supported standard size: Accurate exposure within ≥150mm × 150mm range, minimum substrate size: 5mm × 5mm.
- Lithography resolution: Minimum feature size ≤0.5 µm.
- Equipped with alignment and overlay capability, alignment accuracy: ≤±0.5 µm.
- Efficiency: Writing speed ≥100 mm²/min @1 µm; ≥200 mm²/min @2 µm.
- XYZ, and θ multi-axis precision motion system. Equipped grating positioning with position resolution ≤10 nm.
- Support thickness: 0-15 mm.
- θ-axis adjustment range: ≥7.5 degrees.
- Auto-focus capability: Z-axis adjustment precision ≤10 nm, warpage tolerance ≥100 µm.
- Exposure optional: Including scanning exposure, grayscale exposure, and drag exposure.
- Supports small BMP image repetition and large BMP image stitching.
- Supports 256-level 3D grayscale lithography.
- Supports multiple file formats, including GDSII, BMP, and STL.
- Processing head :10X, 20X, 50X
- Cabinet-style structure with integrated marble base and high-precision air-floating vibration isolation system.